ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. / SHAPOVAL, S Y ; Petrashov, Victor; POPOV, O A ; YODER, M D ; MACIEL, P D ; LOK, C K C .
In: JOURNAL OF VACUUM SCIENCE, Vol. 9, No. 6, 1991, p. 3071-3077.Research output: Contribution to journal › Article › peer-review
Published
| Original language | English |
|---|---|
| Pages (from-to) | 3071-3077 |
| Number of pages | 7 |
| Journal | JOURNAL OF VACUUM SCIENCE |
| Volume | 9 |
| Issue number | 6 |
| Publication status | Published - 1991 |
ID: 578093