Nanolithography with NOVER (Negative Organic Vacuum E-beam Resist)

V Petrashov, J T Abramenko, J I Koval, L Aparshina

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	161-163
Number of pages	3
Journal	MICROELECTRONIC ENGINEERING
Volume	35
Issue number	1-4
Publication status	Published - Feb 1997

Cite this

@article{87ba5700a7974908bdb6a3db0faad96b,

title = "Nanolithography with NOVER (Negative Organic Vacuum E-beam Resist)",

author = "V Petrashov and Abramenko, {J T} and Koval, {J I} and L Aparshina",

year = "1997",

month = feb,

language = "English",

volume = "35",

pages = "161--163",

journal = "MICROELECTRONIC ENGINEERING",

issn = "0167-9317",

publisher = "Elsevier",

number = "1-4",

}