Nanolithography with NOVER (Negative Organic Vacuum E-beam Resist). / Petrashov, V ; Abramenko, J T ; Koval, J I ; Aparshina, L .

In: MICROELECTRONIC ENGINEERING, Vol. 35, No. 1-4, 02.1997, p. 161-163.

Research output: Contribution to journalArticle

Published
Original languageEnglish
Pages (from-to)161-163
Number of pages3
JournalMICROELECTRONIC ENGINEERING
Volume35
Issue number1-4
Publication statusPublished - Feb 1997

ID: 380184