Localization of 4f state in YbRh2Si2 under magnetic field and high pressure: Comparison with CeRh2Si2. / Knebel, G.; Boursier, R.; Hassinger, E.; Lapertot, G.; Niklowitz, P. G.; Pourret, A.; Salce, B.; Sanchez, J. P.; Sheikin, I.; Bonville, P.; Harima, H.; Flouquet, J.

In: Journal of the Physical Society of Japan, Vol. 75, No. 11, 11.2006, p. -.

Research output: Contribution to journalArticlepeer-review

Published
  • G. Knebel
  • R. Boursier
  • E. Hassinger
  • G. Lapertot
  • P. G. Niklowitz
  • A. Pourret
  • B. Salce
  • J. P. Sanchez
  • I. Sheikin
  • P. Bonville
  • H. Harima
  • J. Flouquet
Original languageEnglish
Pages (from-to)-
Number of pages15
JournalJournal of the Physical Society of Japan
Volume75
Issue number11
DOIs
Publication statusPublished - Nov 2006
This open access research output is licenced under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License.

ID: 1245923