Localization of 4f state in YbRh2Si2 under magnetic field and high pressure: Comparison with CeRh2Si2. / Knebel, G.; Boursier, R.; Hassinger, E.; Lapertot, G.; Niklowitz, P. G.; Pourret, A.; Salce, B.; Sanchez, J. P.; Sheikin, I.; Bonville, P.; Harima, H.; Flouquet, J.
In: Journal of the Physical Society of Japan, Vol. 75, No. 11, 11.2006, p. -.Research output: Contribution to journal › Article › peer-review
Original language | English |
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Pages (from-to) | - |
Number of pages | 15 |
Journal | Journal of the Physical Society of Japan |
Volume | 75 |
Issue number | 11 |
DOIs | |
Publication status | Published - Nov 2006 |
ID: 1245923