Localization of 4f state in YbRh2Si2 under magnetic field and high pressure: Comparison with CeRh2Si2. / Knebel, G.; Boursier, R.; Hassinger, E.; Lapertot, G.; Niklowitz, P. G.; Pourret, A.; Salce, B.; Sanchez, J. P.; Sheikin, I.; Bonville, P.; Harima, H.; Flouquet, J.
In: Journal of the Physical Society of Japan, Vol. 75, No. 11, 11.2006, p. -.Research output: Contribution to journal › Article › peer-review
Published
| Original language | English |
|---|---|
| Pages (from-to) | - |
| Number of pages | 15 |
| Journal | Journal of the Physical Society of Japan |
| Volume | 75 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - Nov 2006 |
This open access research output is licenced under a Creative Commons Attribution-NonCommercial-NoDerivs 3.0 Unported License.
ID: 1245923