ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS

S Y SHAPOVAL, Victor Petrashov, O A POPOV, M D YODER, P D MACIEL, C K C LOK

Research output: Contribution to journal › Article › peer-review

Keywords

@article{ad6b8aa9ed074b17b659b78e73cbdedc,

title = "ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS",

keywords = "CVD METHOD, STREAM SOURCE, HYDROGEN",

author = "SHAPOVAL, {S Y} and Victor Petrashov and POPOV, {O A} and YODER, {M D} and MACIEL, {P D} and LOK, {C K C}",

year = "1991",

language = "English",

volume = "9",

pages = "3071--3077",

journal = "JOURNAL OF VACUUM SCIENCE",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "6",

}

TY - JOUR

T1 - ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS

AU - SHAPOVAL, S Y

AU - Petrashov, Victor

AU - POPOV, O A

AU - YODER, M D

AU - MACIEL, P D

AU - LOK, C K C

PY - 1991

Y1 - 1991

KW - CVD METHOD

KW - STREAM SOURCE

KW - HYDROGEN

M3 - Article

SN - 0734-2101

VL - 9

SP - 3071

EP - 3077

JO - JOURNAL OF VACUUM SCIENCE

JF - JOURNAL OF VACUUM SCIENCE

IS - 6

ER -