ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. / SHAPOVAL, S Y ; Petrashov, Victor; POPOV, O A ; YODER, M D ; MACIEL, P D ; LOK, C K C .

In: JOURNAL OF VACUUM SCIENCE, Vol. 9, No. 6, 1991, p. 3071-3077.

Research output: Contribution to journal › Article

Published

Standard

ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. / SHAPOVAL, S Y ; Petrashov, Victor; POPOV, O A ; YODER, M D ; MACIEL, P D ; LOK, C K C .

In: JOURNAL OF VACUUM SCIENCE, Vol. 9, No. 6, 1991, p. 3071-3077.

Research output: Contribution to journal › Article

Harvard

SHAPOVAL, SY, Petrashov, V, POPOV, OA, YODER, MD, MACIEL, PD & LOK, CKC 1991, 'ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS', JOURNAL OF VACUUM SCIENCE, vol. 9, no. 6, pp. 3071-3077.

APA

SHAPOVAL, S. Y., Petrashov, V., POPOV, O. A., YODER, M. D., MACIEL, P. D., & LOK, C. K. C. (1991). ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. JOURNAL OF VACUUM SCIENCE, 9(6), 3071-3077.

Vancouver

SHAPOVAL SY, Petrashov V, POPOV OA, YODER MD, MACIEL PD, LOK CKC. ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. JOURNAL OF VACUUM SCIENCE. 1991;9(6):3071-3077.

Author

SHAPOVAL, S Y ; Petrashov, Victor ; POPOV, O A ; YODER, M D ; MACIEL, P D ; LOK, C K C . / ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS. In: JOURNAL OF VACUUM SCIENCE. 1991 ; Vol. 9, No. 6. pp. 3071-3077.

BibTeX

@article{ad6b8aa9ed074b17b659b78e73cbdedc,
title = "ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS",
keywords = "CVD METHOD, STREAM SOURCE, HYDROGEN",
author = "SHAPOVAL, {S Y} and Victor Petrashov and POPOV, {O A} and YODER, {M D} and MACIEL, {P D} and LOK, {C K C}",
year = "1991",
language = "English",
volume = "9",
pages = "3071--3077",
journal = "JOURNAL OF VACUUM SCIENCE",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "6",

}

RIS

TY - JOUR

T1 - ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS

AU - SHAPOVAL, S Y

AU - Petrashov, Victor

AU - POPOV, O A

AU - YODER, M D

AU - MACIEL, P D

AU - LOK, C K C

PY - 1991

Y1 - 1991

KW - CVD METHOD

KW - STREAM SOURCE

KW - HYDROGEN

M3 - Article

VL - 9

SP - 3071

EP - 3077

JO - JOURNAL OF VACUUM SCIENCE

JF - JOURNAL OF VACUUM SCIENCE

SN - 0734-2101

IS - 6

ER -

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