A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY. / CROSSLEY, A ; SOFIELD, C J ; GOFF, J P ; LAKE, A C I ; HUTCHINGS, M T ; MENELLE, A .

In: Journal of non-Crystalline solids, Vol. 187, 07.1995, p. 221-226.

Research output: Contribution to journalArticlepeer-review

Published

Standard

A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY. / CROSSLEY, A ; SOFIELD, C J ; GOFF, J P ; LAKE, A C I ; HUTCHINGS, M T ; MENELLE, A .

In: Journal of non-Crystalline solids, Vol. 187, 07.1995, p. 221-226.

Research output: Contribution to journalArticlepeer-review

Harvard

CROSSLEY, A, SOFIELD, CJ, GOFF, JP, LAKE, ACI, HUTCHINGS, MT & MENELLE, A 1995, 'A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY', Journal of non-Crystalline solids, vol. 187, pp. 221-226.

APA

CROSSLEY, A., SOFIELD, C. J., GOFF, J. P., LAKE, A. C. I., HUTCHINGS, M. T., & MENELLE, A. (1995). A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY. Journal of non-Crystalline solids, 187, 221-226.

Vancouver

CROSSLEY A, SOFIELD CJ, GOFF JP, LAKE ACI, HUTCHINGS MT, MENELLE A. A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY. Journal of non-Crystalline solids. 1995 Jul;187:221-226.

Author

CROSSLEY, A ; SOFIELD, C J ; GOFF, J P ; LAKE, A C I ; HUTCHINGS, M T ; MENELLE, A . / A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY. In: Journal of non-Crystalline solids. 1995 ; Vol. 187. pp. 221-226.

BibTeX

@article{ce19ddec0b74477bae9c48a90a9f9966,
title = "A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY",
keywords = "TUNNELING MICROSCOPY, OXIDE SURFACES, SI(111), HF",
author = "A CROSSLEY and SOFIELD, {C J} and GOFF, {J P} and LAKE, {A C I} and HUTCHINGS, {M T} and A MENELLE",
year = "1995",
month = jul,
language = "English",
volume = "187",
pages = "221--226",
journal = "Journal of non-Crystalline solids",
issn = "0022-3093",
publisher = "Elsevier",

}

RIS

TY - JOUR

T1 - A STUDY COMPARING MEASUREMENTS OF ROUGHNESS OF SILICON AND SIO2 SURFACES AND INTERFACES USING SCANNING PROBE MICROSCOPY AND NEUTRON REFLECTIVITY

AU - CROSSLEY, A

AU - SOFIELD, C J

AU - GOFF, J P

AU - LAKE, A C I

AU - HUTCHINGS, M T

AU - MENELLE, A

PY - 1995/7

Y1 - 1995/7

KW - TUNNELING MICROSCOPY

KW - OXIDE SURFACES

KW - SI(111)

KW - HF

M3 - Article

VL - 187

SP - 221

EP - 226

JO - Journal of non-Crystalline solids

JF - Journal of non-Crystalline solids

SN - 0022-3093

ER -