@article{ad6b8aa9ed074b17b659b78e73cbdedc,
title = "ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION OF LARGE AREA UNIFORM SILICON-NITRIDE FILMS",
keywords = "CVD METHOD, STREAM SOURCE, HYDROGEN",
author = "SHAPOVAL, \{S Y\} and Victor Petrashov and POPOV, \{O A\} and YODER, \{M D\} and MACIEL, \{P D\} and LOK, \{C K C\}",
year = "1991",
language = "English",
volume = "9",
pages = "3071--3077",
journal = "JOURNAL OF VACUUM SCIENCE",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "6",
}